Material: Graphene (Source: Graphenea Inc. Easy Transfer: Monolayer Graphene on Polymer Film)
Grid: custom SiN TEM chip produced by Silson (3x3 Array of 1 µm thick SiN Windows with circular perforations)
Electronic Lab Notebook sample ID: 1941
Treatment:
	* Transferred onto SiN TEM grid using liquid Transfer method
	* Insertion to UHV System via loadlock including bake
	* Surface contamination removed inside UHV by cleaning laser
	* Irradiated by low Energy Ar Plasma (7min)
	* Removal of mobile contamination via laser heating
	* Beamshower at -20k for 11min
Name of data:
	* map_2024_03_28_17_46
	* map_2024_03_29_12_25
	* map_2024_03_29_14_37
Acquisition date: 28.03.2024 and 29.03.2024