Material: Graphene (Source: Graphenea Inc. Easy Transfer: Monolayer Graphene on Polymer Film)
Grid: custom SiN TEM chip produced by Silson (3x3 Array of 1 µm thick SiN Windows with circular perforations)
Electronic Lab Notebook sample ID: 1942
Treatment:
	* Transferred onto SiN TEM grid using liquid Transfer method
	* Insertion to UHV System via loadlock including bake
	* Surface contamination removed inside UHV by cleaning laser
	* Irradiated by low Energy Ar Plasma (10min)
	* Beamshower at -30k for 20min
Name of data: map_2024_04_02_12_34
Acquisition date: 02.04.2024